Both degradation and AOX accumulation are significantly enhanced in UV/peroxymonosulfate/4-chlorophenol/Cl- system: two sides of the same coin?
Wang, Zhaohui, Feng, Min, Fang, Changling, Huang, Ying, Ai, Luoyan, Yang, Fei, Xue, Ying, Liu, Wenqian, Liu, Jianshe
Chemical instability of graphene oxide following exposure to highly reactive radicals in advanced oxidation processes
Wang, Zhaohui, Sun, Linyan, Lou, Xiaoyi, Yang, Fei, Feng, Min, Liu, Jianshe
Formation of nitrogen functionalities in biochar materials and their role in the mitigation of hazardous emerging organic pollutants from wastewater
Baser, Begum, Yousaf, Balal, Yetis, Ulka, Abbas, Qumber, Kwon, Eilhann E., Wang, Shengsen, Bolan, Nanthi S., Rinklebe, Jorg
Is UV/Ce(IV) process a chloride-resistant AOPs for organic pollutants decontamination?
Liu, Wenqian, Fang, Changling, Huang, Ying, Ai, Luoyan, Yang, Fei, Wang, Zhaohui, Liu, Jianshe
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