Scanning laser lithography with constrained quadratic exposure optimization
- Creator: Fleming, Andrew J. , Ghalehbeygi, Omid T. , Routley, Ben S. , Wills, Adrian G.
- Resource Type: journal article
- Date: 2019
Erratum: investigation of the photochemistry of the poly {p-phenylenevinylene} precursor system: implications for nanolithography [J. Chem. Phys. 126, 174703 (2007)]
- Creator: Cotton, D. V. , Fell, C. J. , Belcher, W. J. , Tachiya, M. , Dastoor, P. C.
- Resource Type: journal article
- Date: 2008