- Title
- Experimental scanning laser lithography with exposure optimization
- Creator
- Fleming, Andrew J.; Ghalehbeygi, Omid T.; Routley, Ben S.; Wills, Adrian G.
- Relation
- 20th IFAC World Congress. 20th IFAC World Congress Proceedings [presented in IFAC-PapersOnLine, Vol. 50, Issue 1] (Toulouse, France 9-14 July, 2017) p. 8662-8667
- Relation
- Funding BodyARCGrant NumberDP150103521 http://purl.org/au-research/grants/arc/DP150103521
- Publisher Link
- http://dx.doi.org/10.1016/j.ifacol.2017.08.1524
- Publisher
- Elsevier
- Resource Type
- conference paper
- Date
- 2017
- Description
- Laser scanning lithography is a maskless method for exposing films of photoresist during semiconductor manufacturing. In this method a focused beam is scanned over a surface with varying intensity to create features in the photoresist. Given the shape of a desired feature, an exposure pattern must be found that approximates this shape in the developed photoresist. This can be cast as an optimization problem, which is complicated by the non-negative nature of the exposure function and the non-linear photochemistry of the film. In this article, a nonlinear programming approach is described that results in a tractable optimization problem which accounts for all of the practical constraints encountered in laser scanning lithography. This method is demonstrated to create a sub-wavelength feature which is verified by optical finite element simulation with a resolution of 20 nm.
- Subject
- laser scanning lithography; photoresist; exposure functions; non-linear photochemistry
- Identifier
- http://hdl.handle.net/1959.13/1395512
- Identifier
- uon:33889
- Identifier
- ISSN:2405-8963
- Language
- eng
- Reviewed
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