- Title
- Generalized predictive control of temperature on an atomic layer deposition reactor
- Creator
- He, Wen-Jie; Zhang, Hai-Tao; Chen, Zhiyong; Chu, Bo; Cao, Kun; Shan, Bin; Chen, Rong
- Relation
- IEEE Transactions on Control Systems Technology Vol. 23, Issue 6, p. 2408-2415
- Publisher Link
- http://dx.doi.org/10.1109/TCST.2015.2404898
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Resource Type
- journal article
- Date
- 2015
- Description
- This brief establishes a closed-loop control system for a radiant heating atomic layer deposition (ALD) reactor using generalized predictive control (GPC). The GPC-based closed-loop control system can rapidly and precisely stabilize the temperature in the presence of external disturbances. Compared with the conventional open-loop control and the proportional-integral-differential control, the closed-loop GPC system enhances the processing efficiency between every ALD run by substantially reducing settling time with impact by external disturbances. The attenuated temperature fluctuation leads to more uniform thin-film morphologies that fulfill the technical requirements of ALD processes.
- Subject
- atomic layer deposition; external disturbance; nanometer thin film; predictive control; temperature control
- Identifier
- http://hdl.handle.net/1959.13/1329593
- Identifier
- uon:26197
- Identifier
- ISSN:1063-6536
- Language
- eng
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