- Title
- Experimental study on the reaction of CCl₃F and CH₄ in a dielectric barrier discharge nonequilibrium plasma reactor
- Creator
- Kundu, Sazal K.; Kennedy, Eric M.; Mackie, John C.; Holdsworth, Clovia I.; Molloy, Thomas S.; Gaikwad, Vaibhav V.; Dlugogorski, Bogdan Z.
- Relation
- ARC.DP130101994
- Relation
- Industrial & Engineering Chemistry Research Vol. 55, Issue 2, p. 463-471
- Publisher Link
- http://dx.doi.org/10.1021/acs.iecr.5b04010
- Publisher
- American Chemical Society
- Resource Type
- journal article
- Date
- 2016
- Description
- The reaction of CCl₃F (CFC-11) with CH₄ (in an argon bath gas) in a dielectric barrier discharge nonequilibrium plasma was examined. Oxygen and nitrogen were excluded from the feed stream and the reactions resulted in the production of fluorine-containing polymers, as well as a range of gaseous products including H₂, HCl, HF, C₂H₃F, C₂H₃Cl, C₂H₂ClF, CHCl₂F, CCl₂F₂, CH₃Cl, CH₂Cl₂, CHCl₃, and C₂Cl₄. The polymeric material synthesized during reaction is characterized as being non-cross-linked and random in nature, containing functional groups including CH₃, CH₂, CHCl, CHF, CF₂, and CF₃. The conversion level of CCl3F increased from 37% to 63% as the input energy density increased from 3 to 13 kJ L–1 (the applied voltage range was 14.1 to 15.2 kV, peak–peak). The electrical discharge was characterized and found to be a slight modification of filamentary discharge toward a diffuse discharge due to the presence of the relatively low concentration of CCl₃F and CH₄ (less than 2% each) in argon. A reaction mechanism is proposed describing the formation of gas phase, as well as polymeric products.
- Subject
- reaction mechanism; CCl₃F (CFC-11); CH₄; chemical reactions
- Identifier
- http://hdl.handle.net/1959.13/1329243
- Identifier
- uon:26110
- Identifier
- ISSN:0888-5885
- Language
- eng
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