Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.13/24688

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Title
Measurement of molecular order and orientation in nanoscale organic films
Author/Creator
Watts, Benjamin;  Thomsen, Lars;  Dastoor, Paul C.
Description
Self-assembled monolayers (SAMs) have, in recent years, attracted much interest for surface modification, surface coatings and as interfacial coupling agents. X-ray photoelectron spectroscopy (XPS) and carbon K-edge near edge X-ray absorption fine structure (NEXAFS) have been used to non-destructively measure the molecular conformation of organic films with thickness of the order of 1nm. Three different types of molecular conformation were found for γ-aminopropyltriethoxysilane (γ-APS) films formed on ZnO surfaces. The orientation of γ-APS films was observed to vary with adsorption time and surface coverage. Thus the molecular conformation of thin films can be controlled through adjustment of the application parameters.
Relation
Synthetic Metals Vol. 152, no. 1-3, p. 21-24
Date
2005
Publisher
Elsevier
Resource Type
journal article
Identifier
http://hdl.handle.net/1959.13/24688
Identifier
ISSN:0379-6779
Language
eng
Reviewed
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Subject
"Synthetic Metals"
 
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