Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.13/43287
- Title
- The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering
- Author/Creator
-
Field, M. R.;
McCulloch, D. G.;
Lim, S. N. H.;
Anders, A.;
Keast, V. J.;
Burgess, R. W.
- Institution
- The University of Newcastle. Faculty of Science & Information Technology, School of Mathematical and Physical Sciences
- Description
- Pulsed cathodic arc and pulsed magnetron sputtered WO₃ thin films were investigated using electron microscopy. It was found that the cathodic arc deposited material consisted of the α-WO₃ phase with a high degree of crystallinity. In contrast, the magnetron sputtered material was highly disordered making it difficult to determine its phase. Electron energy-loss spectroscopy was used to study the oxygen K edge of the films and it was found that the near-edge fine structures of films produced by the two deposition methods differed. The oxygen K-edge near-edge structures for various phases of WO₃ were calculated using two different self-consistent methods. Each phase was found to exhibit a unique oxygen K edge, which would allow different phases of WO₃ to be identified using x-ray absorption spectroscopy or electron energy-loss spectroscopy. Both calculation methods predicted an oxygen K edge for the. γ-WO₃ phase which compared well to previous x-ray absorption spectra. In addition, a close match was found between the oxygen K edges obtained experimentally from the cathodic arc deposited material and that calculated for the α-WO₃ phase.
- Relation
- Journal of Physics: Condensed Matter Vol. 20, Issue 17
- Relation
- http://dx.doi.org/10.1088/0953-8984/20/17/175216
- Date
- 2008
- Publisher
- Institute of Physics (IOP) Publishing
- Keyword(s)
-
charge state distributions;
near edge structures;
x-ray absorption;
crystal structure;
WO₃;
phase;
field
- Resource Type
- journal article
- Identifier
- http://hdl.handle.net/1959.13/43287
- Identifier
- ISSN:0953-8984
- Reviewed

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