Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.13/34051
- Title
- Molecular dissociation of group-V hydrides on Si(001)
- Author/Creator
-
McDonell, T. L.;
Marks, N. A.;
Warschkow, O.;
Wilson, H. F.;
Smith, P. V.;
Radny, M. W.
- Institution
- The University of Newcastle. Faculty of Engineering & Built Environment, School of Engineering
- Description
- We present a comparative ab initio survey of possible dissociation products of NH₃, PH₃, and AsH₃ on the Si(001) surface. In agreement with previous studies, we find that the relative energetics of XH₃ and XH₂ species (X=N, P , As) are common across all three systems. In contrast, the energetics of the onward dissociation into XH and X species differs markedly between nitrogen on the one hand, and phosphorus and arsenic on the other.
- Relation
- Physical Review B Vol. 72, Issue 19
- Publisher Link
- http://dx.doi.org/10.1103/PhysRevB.72.193307
- Date
- 2005
- Publisher
- American Physical Society
- Keyword(s)
-
Si(001);
ab initio survey;
dissociation;
XH₃;
XH₂
- Resource Type
- journal article
- Identifier
- http://hdl.handle.net/1959.13/34051
- Identifier
- ISSN:1098-0121
- Reviewed

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