Please use this identifier to cite or link to this item: http://hdl.handle.net/1959.13/33325

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Title
Understanding the conformational dynamics of organosilanes: γ-APS on zinc oxide surfaces
Author/Creator
Watts, B.;  Thomsen, L.;  Fabien, J. R.;  Dastoor, P. C.
Institution
The University of Newcastle. Faculty of Science & Information Technology, School of Mathematical and Physical Sciences
Description
The oscillatory adsorption and orientation of thin films of γ-(aminopropyl)triethoxysilane (γ-APS) on zinc oxide surfaces have been investigated using X-ray photoelectron spectroscopy. Two different values of solution pH were chosen, one above and one below the isoelectric point (IEP) of the substrate. At both values of pH, films of organosilane molecules aligned perpendicular to the surface are produced. Moreover, varying the electrokinetics of the adsorption process radically alters the molecular orientation during oscillatory adsorption. When γ-APS is adsorbed at pH 6.4 (i.e., lower than the IEP of the metal substrate) the molecules are oriented with the silanol groups at the interface, whereas at pH 10.4 the molecules are oriented with the amine groups at the interface. The oscillation in the adsorbed coverage of γ-APS is correlated with either a disordering of the film or a realignment of the γ-APS molecules parallel to the surface.
Relation
Langmuir Vol. 18, Issue 1, p. 148-154
Publisher Link
http://dx.doi.org/10.1021/la011058+
Date
2002
Publisher
American Chemical Society
Keyword(s)
organosilanes;  zinc oxide surfaces;  isoelectric point;  γ-(aminopropyl)triethoxysilane;  γ-APS molecules
Resource Type
journal article
Identifier
http://hdl.handle.net/1959.13/33325
Identifier
ISSN:0743-7463
Reviewed
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Subject
"Langmuir"
 
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